CMW Series Polishing Fluid Depth Wound Filter Cartridge with Low Precipitation High Dirt Holding Capacity and Effective Filtration

PLPE Series Electronic Process Water Filter Cartridge

CMW Series polishing fluid depth wound filter cartridge is designed for CMP slurry and polishing liquid filtration. This series adopts a special wound depth structure, which can effectively intercept large particles and release effective polishing particles in CMP slurry. The gradient structure from outside to inside increases dirt holding space, reduces surface clogging, and helps extend the service life of the filter cartridge.

With all-polypropylene construction, low precipitation, high dirt holding capacity, and stable filtration performance, CMW Series is suitable for polishing liquid filtration in semiconductor, electronics, wafer processing, and precision surface treatment applications.

• Low Precipitation: The filter cartridge is made of all-polypropylene material and manufactured by thermal welding technology without adhesives. This helps reduce leaching and precipitation, making it suitable for cleaner process filtration.
• Effective Filtration: The unique wound structure can accurately filter CMP slurry, efficiently intercept large particles, and allow effective polishing particles to pass through, helping maintain slurry performance during filtration.
• High Dirt Holding Capacity and Long Service Life: The gradient structure from outside to inside helps avoid rapid surface clogging caused by condensed slurry. It provides full use of dirt holding space, higher contaminant loading capacity, and longer service life.
• Prevent Fiber Shedding: The unique net cover structure helps prevent fibers on the filter cartridge surface from falling off, improving product cleanliness and filtration stability.

Compared with ordinary wound filter cartridges, CMW Series is specially designed for polishing liquid filtration. Its gradient wound structure helps control large particles while preserving effective polishing particles in the slurry.

The all-PP construction and adhesive-free welding process reduce leaching risk and improve cleanliness. The anti-fiber-shedding structure also helps maintain stable filtration performance in demanding polishing processes.

For CMP slurry and polishing liquid applications, CMW Series can help reduce clogging, extend replacement intervals, and improve process stability.

We provide comprehensive technical support for installation, operation, and maintenance, including filter replacement guidance and maintenance recommendations. Complete documentation includes user manuals, installation guides, and troubleshooting notes.

Shanghai Pullner Filtration Technology Co., Ltd. was established in May 2011 with a registered capital of RMB 26 million. The company operates a Class 100,000 cleanroom workshop (3,000 m²) and an on-site Class 1,000 clean laboratory, integrating R&D, manufacturing, and sales of microporous membrane filtration equipment and filtration systems.

Pullner products are widely applied in microelectronics, fine chemicals, new energy, seawater desalination, biotech, and laboratory fields, including LCD panels, semiconductor processing, high-purity chemicals, condensate filtration, and reclaimed water reuse.

The company holds ISO9001 / ISO14001 / ISO45001 certificates, is recognized as a high-tech enterprise, and owns multiple patents. Pullner is also an approved vendor of Saudi Aramco.